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Reading Alloys manufactures titanium powder that can subsequently be used to make specialty targets for a wide range of applications. Sputtering target producers rely on Reading Alloys powders to provide materials that have high quality and high purity while controlling particle size.
Sputtering is a technique used to deposit thin films of material onto a substrate surface. During a vacuum evaporation process, portions of a coating material called the target are physically removed and a thin, firmly bonded film is deposited onto the substrate. The process occurs by bombarding the surface of the sputtering target with gaseous ions under high-voltage acceleration. The resulting coating is held firmly to the surface by mechanical forces.
Sputtering has proven to be a successful method of coating a variety of substrates with thin films of electrically conductive or non-conductive materials. Major applications include semiconductors, micro-components, flat panel displays, magnetic and optical storage devices, wear and corrosion resistant coatings, solar cells and others.
Growth industries such as electronics and semiconductors depend on the production of new materials for a wide range of sputtering targets using advanced technology.
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